Dry etch technology : 9-10 September 1991, San Jose, California /

Dry etch technology : 9-10 September 1991, San Jose, California /

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Bibliographic Details
Corporate Authors: Society of Photo-Optical Instrumentation Engineers, Society of Photo-optical Instrumentation Engineers, Symposium on Microelectronic Processing Integration
Other Authors: Ranadive, Deepak
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash. : SPIE, c1992
Bellingham, Wash., USA : 1992
Bellingham, Wash., USA : [1992], ©1992
Bellingham, Wash., USA : c1992
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1593
Proceedings of SPIE--the International Society for Optical Engineering v. 1593
Subjects:
Integrated circuits > Design and construction > Congresses
Microelectronics > Congresses
Microelectronics > Materials > Congresses
Microlithography > Congresses
Plasma etching > Congresses
Semiconductor wafers
Semiconductors > Etching > Congresses
Microelectronics > Materials
Plasma etching
Semiconductors > Etching
Conference papers and proceedings

Internet

Stanford University

Holdings details from Stanford University
Call Number: TA1505 .P76 V.1593

Duke University

Holdings details from Duke University
Call Number: TK7871.85 .D798 1992

Cornell University

Holdings details from Cornell University
Call Number: TK7871.85 .D78 1991

Princeton University

Holdings details from Princeton University
Call Number: TK7871.85 .D793 1992

Columbia University

Holdings details from Columbia University
Call Number: TK7871.85 .D79 1992g

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